191-->195: H radical away from DMDMOS, DMDMOS (Si-OH) lost CH3 radical by H atom attack  (TSS)
    1.0
            20.00000000 0.00000000 0.00000000 
            0.00000000 15.00000000 0.00000000 
            0.00000000 0.00000000 15.00000000 
  Si O C H
  1 4 4 13
Direct
        0.80441283 0.63839906 0.85110053      	#	1      	Si
        0.26517606 0.48319957 0.94803452      	#	2      	O1
        0.83827612 0.49034053 0.67417417      	#	3      	O2
        0.22225633 0.04157425 0.54463942      	#	4      	O3
        0.37909353 0.67580427 0.54914887      	#	5      	O4
        0.90850596 0.92212703 0.87047633      	#	6      	C1
        0.23942962 0.07039803 0.60973448      	#	7      	C2
        0.67449274 0.86038617 0.84646855      	#	8      	C3
        0.23422657 0.23143571 0.15347395      	#	9      	C4
        0.79046588 0.82088415 0.41707738      	#	10     	H1
        0.88985870 0.84717182 0.80430615      	#	11     	H2
        0.47561200 0.42062106 0.49057708      	#	12     	H3
        0.49469742 0.95337949 0.29876168      	#	13     	H4
        0.46254562 0.90886526 0.30327805      	#	14     	H5
        0.79511070 0.49523766 0.61371486      	#	15     	H6
        0.72237974 0.60157961 0.89348334      	#	16     	H7
        0.20311149 0.91539739 0.81867520      	#	17     	H8
        0.83190834 0.79902721 0.39747992      	#	18     	H9
        0.21133037 0.87849745 0.20453785      	#	19     	H10
        0.98556104 0.89045449 0.83409538      	#	20     	H11
        0.18884704 0.38435980 0.54474990      	#	21     	H12
        0.11330501 0.16420240 0.92797778      	#	22     	H14