191-->195: H radical away from DMDMOS, DMDMOS (Si-OH) lost CH3 radical by H atom attack  (TSS)
    1.0
            20.00000000 0.00000000 0.00000000 
            0.00000000 15.00000000 0.00000000 
            0.00000000 0.00000000 15.00000000 
  Si O C H
  1 4 4 13
Direct
        0.68519863 0.60775598 0.72879109      	#	1      	Si
        0.17964228 0.52867767 0.03292168      	#	2      	O1
        0.63749777 0.52197998 0.71659511      	#	3      	O2
        0.20103485 0.04384607 0.63999761      	#	4      	O3
        0.07347769 0.52206519 0.66193979      	#	5      	O4
        0.95786940 0.77848371 0.89276897      	#	6      	C1
        0.16289174 0.53963701 0.10769452      	#	7      	C2
        0.58513301 0.86493192 0.75245649      	#	8      	C3
        0.01872990 0.24838414 0.07086241      	#	9      	C4
        0.79668405 0.71407121 0.61798814      	#	10     	H1
        0.86290639 0.85869158 0.76640178      	#	11     	H2
        0.35487291 0.47157682 0.57936186      	#	12     	H3
        0.16969170 0.47647368 0.45962398      	#	13     	H4
        0.74235630 0.16798957 0.99214283      	#	14     	H5
        0.44305872 0.37067931 0.10156319      	#	15     	H6
        0.59025187 0.65788646 0.09995565      	#	16     	H7
        0.01015284 0.87856016 0.78074990      	#	17     	H8
        0.61232290 0.83150749 0.69343446      	#	18     	H9
        0.02445930 0.47476776 0.16344506      	#	19     	H10
        0.96097165 0.79889726 0.98410723      	#	20     	H11
        0.96995061 0.37726695 0.64142459      	#	21     	H12
        0.61848841 0.68931851 0.10165160      	#	22     	H14