[Thu Jul 24 22:48:27 CST 2025] [MD] [warn] 'Starting MedeA Core 3.8.1' Forcefield set to: ReaxFF_CHONFClSi File: Forcefields.kit::ReaxFF/CHONFClSi.frc md5 sum: EEC6072DC40A6886440A054B739F8348 MedeA version 3.8.1 #------------------------------------------------------------------------------- # This calculation has 2 stages #------------------------------------------------------------------------------- Stage 1: Variables tstep = 0.2 fs T = 300 K Stage 2: This LAMMPS calculation has 3 stages: Stage 2.1: Initialize LAMMPS for a ReaxFF type of forcefield 'ReaxFF_CHONFClSi' (from Forcefields.kit::ReaxFF/CHONFClSi.frc) Current system formula: Si193C3O388H9 (Si193C3O388H9) Use of an ReaxFF forcefield results in the specialized nonbond term handling in LAMMPS: Reported "van der Waals" energy (Evdw) includes all nonbond, non-Coulombic energy terms. Run LAMMPS on GPU. Stage 2.2: Set the velocities for 300 K Stage 2.3: NVE integration for Deposition for 1000 ps with a timestep of $tstep Deposit 1 TMOS particle every 4 ps, for a total of 250 deposits: Impact energy is 0.5 eV Deposition region is between 50 and 60 Ang along Z Evaporation region is above 90 along Z Evaporate every 1000 steps Langevin thermostat at $T with 100 applied to subset: thermoset #------------------------------------------------------------------------------- # Running the calculation #------------------------------------------------------------------------------- Stage 1: Variables tstep = 0.2 fs T = 300 K This current forcefield (ReaxFF_CHONFClSi) doesn't handle bonded interactions, bonds will be removed from the structure so that deposition stage can operate properly. Stage 2: This LAMMPS calculation has 3 stages: The forcefield charges were set automatically for ReaxFF_CHONFClSi Stage 2.1: Initialize LAMMPS for a ReaxFF type of forcefield 'ReaxFF_CHONFClSi' (from Forcefields.kit::ReaxFF/CHONFClSi.frc) Current system formula: Si193C3O388H9 (Si193C3O388H9) Use of an ReaxFF forcefield results in the specialized nonbond term handling in LAMMPS: Reported "van der Waals" energy (Evdw) includes all nonbond, non-Coulombic energy terms. Run LAMMPS on GPU. Stage 2.2: Set the velocities for 300 K Stage 2.3: NVE integration for Deposition for 1000 ps with a timestep of $tstep Deposit 1 TMOS particle every 4 ps, for a total of 250 deposits: Impact energy is 0.5 eV Deposition region is between 50 and 60 Ang along Z Evaporation region is above 90 along Z Evaporate every 1000 steps Langevin thermostat at $T with 100 applied to subset: thermoset Property Value +/- Uncertainty Units After Steps % Run ------------------ ---------- ----------- ------------- ------------ ------- t: 1000000.0 fs T: 300.8 +/- 0.25 K 0 0.0% P: -1960 +/- 210 atm 1000000 20.0% V: 39548.5 +/- 0 Ang^3 0 0.0% rho: 0.667 +/- 0.031 g/mL 500000 10.0% Etotal: -6040 +/- 400 eV 500000 10.0% Epot: -6060 +/- 400 eV 500000 10.0% Ekin: 22.357 +/- 0.018 eV 0 0.0% Evdw: -5280 +/- 370 eV 500000 10.0% Ecoul: -785 +/- 28 eV 500000 10.0% Sxx: 1850 +/- 180 atm 1000000 20.0% Syy: 2750 +/- 200 atm 500000 10.0% Szz: 1260 +/- 260 atm 1000000 20.0% Syz: -10 +/- 88 atm 0 0.0% Sxz: -26 +/- 57 atm 0 0.0% Sxy: 43 +/- 79 atm 0 0.0% Elan did not converge in 5000000 steps Elan: 3730 +/- 190 eV 4000000 80.0% LAMMPS stage successfully completed on 1 core(s) on Fri 25 July 2025 at 18:29:08 CST after 70839 s (19:40:39) Entire job completed on Fri 25 July 2025 at 18:29:08 CST after 70839 s (19:40:39) and running 1 tasks.