[Wed Jul 23 23:35:30 CST 2025] [MD] [warn] 'Starting MedeA Core 3.8.1' Forcefield set to: ReaxFF_CHONFClSi File: Forcefields.kit::ReaxFF/CHONFClSi.frc md5 sum: EEC6072DC40A6886440A054B739F8348 MedeA version 3.8.1 #------------------------------------------------------------------------------- # This calculation has 2 stages #------------------------------------------------------------------------------- Stage 1: Variables tstep = 0.2 fs T = 300 K Stage 2: This LAMMPS calculation has 3 stages: Stage 2.1: Initialize LAMMPS for a ReaxFF type of forcefield 'ReaxFF_CHONFClSi' (from Forcefields.kit::ReaxFF/CHONFClSi.frc) Current system formula: Si193C2O388H6 (Si193C2O388H6) Use of an ReaxFF forcefield results in the specialized nonbond term handling in LAMMPS: Reported "van der Waals" energy (Evdw) includes all nonbond, non-Coulombic energy terms. Run LAMMPS on GPU. Stage 2.2: Set the velocities for 300 K Stage 2.3: NVE integration for Deposition for 100 ps with a timestep of $tstep Deposit 1 TMOS particle every 4 ps, for a total of 25 deposits: Impact energy is 0.5 eV Deposition region is between 50 and 60 Ang along Z Evaporation region is above 90 along Z Evaporate every 1000 steps Langevin thermostat at $T with 100 applied to subset: thermoset #------------------------------------------------------------------------------- # Running the calculation #------------------------------------------------------------------------------- Stage 1: Variables tstep = 0.2 fs T = 300 K This current forcefield (ReaxFF_CHONFClSi) doesn't handle bonded interactions, bonds will be removed from the structure so that deposition stage can operate properly. Stage 2: This LAMMPS calculation has 3 stages: The forcefield charges were set automatically for ReaxFF_CHONFClSi Stage 2.1: Initialize LAMMPS for a ReaxFF type of forcefield 'ReaxFF_CHONFClSi' (from Forcefields.kit::ReaxFF/CHONFClSi.frc) Current system formula: Si193C2O388H6 (Si193C2O388H6) Use of an ReaxFF forcefield results in the specialized nonbond term handling in LAMMPS: Reported "van der Waals" energy (Evdw) includes all nonbond, non-Coulombic energy terms. Run LAMMPS on GPU. Stage 2.2: Set the velocities for 300 K Stage 2.3: NVE integration for Deposition for 100 ps with a timestep of $tstep Deposit 1 TMOS particle every 4 ps, for a total of 25 deposits: Impact energy is 0.5 eV Deposition region is between 50 and 60 Ang along Z Evaporation region is above 90 along Z Evaporate every 1000 steps Langevin thermostat at $T with 100 applied to subset: thermoset Property Value +/- Uncertainty Units After Steps % Run ------------------ ---------- ----------- ------------- ------------ ------- t: 100000 fs T: 301.43 +/- 0.4 K 0 0.0% P: -1254 +/- 96 atm 100000 20.0% V: 39548.5 +/- 0 Ang^3 0 0.0% rho: 0.5353 +/- 0.0078 g/mL 200000 40.0% Etotal: -4264 +/- 91 eV 200000 40.0% Epot: -4286 +/- 91 eV 200000 40.0% Ekin: 22.404 +/- 0.03 eV 0 0.0% Evdw: -3622 +/- 83 eV 200000 40.0% Ecoul: -663.8 +/- 8 eV 200000 40.0% Sxx: 1130 +/- 190 atm 50000 10.0% Syy: 2246 +/- 89 atm 100000 20.0% Szz: 290 +/- 130 atm 0 0.0% Syz: -90 +/- 110 atm 0 0.0% Sxz: 80 +/- 110 atm 0 0.0% Sxy: 157 +/- 59 atm 50000 10.0% Elan: 463 +/- 22 eV 350000 70.0% LAMMPS stage successfully completed on 1 core(s) on Thu 24 July 2025 at 01:16:22 CST after 6051 s (1:40:51) Entire job completed on Thu 24 July 2025 at 01:16:22 CST after 6051 s (1:40:51) and running 1 tasks.